MEMS lithography is another core area of expertise at Micralyne.
We offer non-contact and contact lithography with the following features and high levels of accuracy:
Contact 1:1 Lithography
- Minimum features: 1 μm (vacuum contact mode)
- 3 μm (proximity mode)
- Alignment accuracy: 1 μm (front side align)
- 3 μm (front to back side align)
Stepper 5:1 Lithography
- Minimum features: 0.5 μm
- Alignment accuracy: 0.1 μm
Resist Thicknesses for Positive and Negative Resists
- 1um to 50um
- SU-8, Polyimide, Lift-off, Shadow Masks
Contact us to learn more about our MEMS Lithography expertise.