Virtually all MEMS and microfabricated devices start with a pattern on the wafer to perform a variety of physical and chemical processes on the substrate. This patterning is used to selectively isolate certain areas of the die for deposition, etching, doping and other activities. The primary method used to create the pattern is photolithography. Teledyne Micralyne uses both contact aligners and steppers to provide various photolithography capabilities. Review the photolithography capabilities of our sister foundry, Teledyne DALSA.